A layout-dependent circuit-design model from Toshiba helps boost gate density and improve cost-performance in next-generation 45-nm CMOS technology. More specifically, 45-nm CMOS gate density can be 2 ...
As author R. Jacob “Jake” Baker points out in the preface to this comprehensive volume, CMOS technology has dominated the fabrication of ICs for 25 years, and is likely to dominate it for another 25 ...
With lithography techniques rapidly approaching 0.10 µm andsmaller, the combination of small device dimensions and high-speeddata rates causes many problems for IC ...
Editor’s note: I am pleased to bring you an important technical blog by Fernando Lavalle, a Ph.D. student at Texas A&M University and his colleague, Suraj Prakash, who have been working and studying ...
Spirea AB is a Swedish fabless semiconductor company developing highly integrated low-power, low-cost radio solutions for the Wireless LAN and PAN markets. This article describes how we assembled a ...
Advances in integrated circuit technology and fabrication have made it possible to leverage traditional CMOS fabrication processes and materials and apply them to the design of Photonic Integrated ...
MEMS-based component suppliers want to rapidly ramp their designs into high-volume production. This demand is driving MEMS suppliers to focus on ways to more efficiently re-use established process ...
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